Plasma and Vapor Deposition Processes

As industries demand better performance and resource efficiency, plasma and vapour deposition processing has become essential for synthesizing and integrating advanced chemicals and materials into next-generation devices and systems. Across the energy, aerospace, microelectronics and surface engineering sectors, there is a growing demand for advanced coatings that enhance durability, functionality and sustainability.

Meeting these demands requires a high level of expertise in plasma-matter interactions and advanced vapour deposition processes. This includes controlling the conversion of small and low-energy molecules into advanced chemicals and the synthesis and integration of advanced materials – both organic and inorganic – onto complex, sensitive or large-area substrates. Scaling reliably from laboratory setups to industrial-level systems adds another layer of complexity.

Objectives

The Plasma & Vapour Deposition Processes group develops fundamental and technological expertise in plasma-matter interactions and advanced vapour deposition processes. Its aim is to define, design and develop new processes and prototypes that push the boundaries of plasma processes, surface engineering and coating technologies.

The main objectives of the group are to develop a deep understanding of the mechanisms driving plasma and vapour deposition processes and provide technical solutions to engineer new processes and create new products or improve existing ones.

Activities span the entire innovation chain and multiple TRLs from idea generation to conceptualization, proof of concept, prototyping, process validation, and finally, process and product optimization.

Scope of expertise

The Plasma & Vapour Deposition Processes group brings together a multidisciplinary team of researchers and engineers with expertise spanning plasma physics, plasma chemistry, surface science, thin-film engineering, chemistry and process engineering. This broad and complementary knowledge base enables the group to address complex problems, from fundamental understanding to practical implementation, thereby advancing innovative solutions in material development, surface modification, and plasma and vapour deposition processes.

Its technological capabilities are currently articulated around five core technologies that place LIST at the forefront of coatings and surface engineering R&D:

  • Plasma processes
  • Plasma-enhanced chemical vapour deposition (PECVD)
  • Oxidative chemical vapour deposition (oCVD)
  • Physical vapour deposition (PVD)
  • High-temperature chemical vapour deposition (HTCVD)


Taking advantage of the new processes and prototypes developed, the group integrates materials into new devices and applications. It has notably gained experience in designing and developing vapour deposition processes and a variety of vapour deposition equipment, ranging from small laboratory-scale setups to semi-industrial systems, enabling the integration of materials in thin-film form onto temperature-sensitive, complex shapes (0D, 1D, 2D, 3D) and large substrates.

Beyond this, the group also relies on these developments for the discovery and engineering of new functional materials for applications ranging from adhesion and corrosion applications to advanced energy applications. The vapour deposition processes developed enable the synthesis, deposition and engineering of materials ranging from organic (e.g. polymers) to inorganic compositions (e.g. oxides, nitrides, metals). Not only the composition of the materials, but also the application process itself critically determines the characteristics and performance of the coatings.

Our people

ABDI Zahra

Plasma and Vapor Deposition Processes

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ARL Didier

Plasma and Vapor Deposition Processes

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BABA Kamal

Plasma and Vapor Deposition Processes

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BOSCHER Nicolas

Plasma and Vapor Deposition Processes

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BULOU Simon

Plasma and Vapor Deposition Processes

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CAMELI Fabio

Plasma and Vapor Deposition Processes

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CHEMIN Jean-Baptiste

Plasma and Vapor Deposition Processes

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DE SOUZA LAMIM Thiago

Plasma and Vapor Deposition Processes

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ELMAGHRABI Heba

ELMAGHRABI Heba

Plasma and Vapor Deposition Processes

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GAULAIN Thomas

GAULAIN Thomas

Plasma and Vapor Deposition Processes

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JACOB Julien

Plasma and Vapor Deposition Processes

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KADOK Joris

KADOK Joris

Plasma and Vapor Deposition Processes

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KHAN Muhammad Awais

Plasma and Vapor Deposition Processes

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LOTITO Sara

Plasma and Vapor Deposition Processes

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MALLMANN Joao Gustavo

Plasma and Vapor Deposition Processes

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MARTINEZ MARTINEZ Diego

Plasma and Vapor Deposition Processes

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MOUDOUD Djazia

MOUDOUD Djazia

Plasma and Vapor Deposition Processes

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NADA Amr

Plasma and Vapor Deposition Processes

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PAGNACCO Maxime

PAGNACCO Maxime

Plasma and Vapor Deposition Processes

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QUINTANA VICENTE Roberto

Plasma and Vapor Deposition Processes

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ROTONNELLI Benjamin

Plasma and Vapor Deposition Processes

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SAEZ HERNAEZ Aitor

Plasma and Vapor Deposition Processes

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SAGET Manon

Plasma and Vapor Deposition Processes

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SEJATI Emut Sukma

Plasma and Vapor Deposition Processes

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Our latest projects

RESUPPLI

High Resistance Superhydrophobic Plasma Films

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Our latest publications

Oxidant-controlled band structure and charge transport in benzothiadiazole-based conjugated polymers prepared by oxidative chemical vapor deposition

Lotito S., Nada A.A., Boudjema L., Bourzami R., Crêpellière J., Mauchauffé R., Mongiovì C., Perrotta A., Milella A., Boscher N.D.

Materials and Design, vol. 264, art. no. 115727, 2026

Role of metal ion promoters in carbon nanotubes functionalization by polydopamine in the perspective of electroplated copper–carbon composites

Silva E., Guillot J., Grysan P., Lenoble D., Barborini E., Arl D.

Reaction Chemistry and Engineering, vol. 11, n° 2, pp. 334-345, 2026

Tuning photocatalytic activity of g-C3N4 through Cu deposition via chemical reduction and a DBD plasma method for visible-light-driven Cr(vi) reduction

Petrović J., Bjelajac A., Mudrinić T., Guillot J., Bulou S., Petrović R.

Rsc Advances, vol. 16, n° 18, pp. 16376-16388, 2026

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